A KlearView™ of All Reticle Data
Sep 16, 2020
Complex, high-volume semiconductor manufacturing processes require advanced optical and EUV reticles. These reticles must be error-free, as reticle defects or...
New Defect Inspection System for SiC, GaN Substrates
Aug 27, 2020
Today KLA Instruments announced the Candela® 8520 defect inspection system for power device applications. It is the successor to the ...
Breakthrough e-Beam Defect Inspection System
Jul 20, 2020
Today KLA Corporation (NASDAQ: KLAC) announced the revolutionary eSL10™ e-beam patterned-wafer defect inspection system. The new system is designed to accelerate time-to-market for...
SPTS’s Synapse™ for AlN/AlScN Etch for BAW Filters
Jul 20, 2020
In this article, SPTS, A KLA Company, demonstrates how their Synapse ™ plasma system can provide significant advantages over Inductively...