KLA is continuing the tradition of sponsoring SPIE Photomask + Extreme Ultraviolet Lithography. In addition to the sponsorship, KLA’s Le Wang will present “Innovative Applications: Extending Photomask Registration Tool for Critical Dimension Measurement to Achieve High Efficiency”, Steinbeck 2, Wednesday, October 4, 3:05 – 3:20.

SPIE Photomask + Extreme Ultraviolet Lithography is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.