Patterning Simulation
Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
PROLITH™
Real Virtual Patterning
The PROLITH™ lithography and patterning simulation solution uses innovative models to accurately simulate how designs will print on the wafer. PROLITH is used by IC, LED and MEMS manufacturers, scanner companies, track companies, mask manufacturers, material providers and research consortia to cost-effectively evaluate patterning technologies, including EUV lithography and multiple patterning techniques. As a critically important modeling tool for all patterning processes, PROLITH helps lithographers understand how pattern printing is affected by multiple lithography variables while significantly reducing the time required to identify workable solutions.
Users Only site Technical SupportApplications
Advanced patterning simulation, Wafer topography modelingRelated Products
PROLITH 2020b: Windows based, physical lithography simulator capable of deterministic and stochastic output. PROLITH 2020b provides rigorous handling of mask topography, wafer topography, photoresist modeling and SEM metrology for quantitatively accurate output.
PROLITH Enterprise 2020b: All the features of the core PROLITH 2020b, plus a scalable Linux engine suitable for large simulation jobs, e.g. stochastic simulation of “Black Swan” events in EUV lithography or tasks that require running thousands of mask clips. An optional enhanced dissolution model that accurately describes the behavior of NTD (Negative Tone Development) chemically amplified resists is available.