The SEMI Technology Symposium (STS) 2018, held in conjunction with SEMICON Korea 2018, will provide a dynamic agenda of sessions and presentations on a wide variety of topics in the area of next-generation semiconductor manufacturing. Topics covered include: Advanced Lithography, Interconnection & Advanced Process, Device, Plasma Science and Etching, Contamination-free Manufacturing and CMP Technology, and Electropackage System and Interconnect Product. STS focuses specifically on exploring current and future trends in semiconductor design and manufacturing. KLA-Tencor will be participating in the Metrology & Inspection Forum and the Contamination-free Manufacturing & CMP Technology Forum during the SEMI Technology Symposium (STS) 2018. Our presentations in the MI Forum are "EUV Reticle Management from Mask Shop to Fab" presented by Moshe Preil and "MRAM HVM Metrology Challenge and Innovative MR Solution" presented by Lu Yu. Keebum Jung will present "Advanced Unpatterned Wafer Inspection for Process Control" in the CFM Forum.