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SPIE Advanced Lithography Conference

KLA is proud to be a sponsor of the Karel Urbánek Best Student Paper Award at the SPIE Advanced Lithography Conference. We will have several co-authored technical presentations, summarizing the latest process control work with our customers.

SPIE Advanced Lithography is the leading global lithography event. The latest advancements in optical lithography, metrology, and EUV will be discussed. Leaders attend the conference to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

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