The 37th Photomask Symposium, organized by SPIE and BACUS, the International Photomask Group of SPIE, provides the format to present advances in technology and their impact on the semiconductor lithography industry. As the Symposium Chairs, we urge you to participate by submitting your abstract(s), and to encourage your colleagues to do the same. Also encourage your company to continue their support for the Photomask Technology Symposium. View more info