Power Crazy! Critical Plasma Etching Applications to Meet the Demands for Wide Bandgap Devices

Apr 29, 2020

This webinar will review specific etch needs and show examples of high productivity solutions for manufacturing SiC and GaN-based power devices. These will include hard-mask open and shallow SiC trench etching, deep SiC via formation for RF and low damage SiNx and GaN etching primarily for GaN on Si structures. End-point detection, an essential method of process control, will also be discussed.

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