PECVD Dielectric Films for RF & Power Compound Semiconductor Applications

Jun 17, 2020

In this webinar, we will discuss PECVD process and hardware optimization for the production of SiN films with the productivity required for high volume manufacturing of power and RF devices. We’ll show how processes can be tuned to run at low plasma densities to minimise surface damage to sensitive GaN devices and discuss bow compensation strategies to minimize bow and warp on thinner substrates.

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