Candela® 8520 Surface Defect Inspection System

Candela® 8520 Surface Defect Inspection System

The Candela 8520 second generation integrated photoluminescence (PL) and surface inspection system is designed for advanced characterization of substrate and epitaxial defects on SiC and GaN substrates. Implementation of automated wafer inspection with statistical process control (SPC) methodology significantly cuts yield loss due to epi defects, minimizes metal-organic chemical vapor deposition (MOCVD) reactor process excursions, and increases MOCVD reactor uptime.

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