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SPIE Photomask Extreme Ultraviolet Lithography

KLA is proud to be a sponsor for SPIE Photomask + Extreme Ultraviolet Lithography. In addition to the sponsorship, KLA will have three presentations:

  • Anatoly Burov
    “Depth of Focus in High-NA EUV Lithography: A Simulation Study”
    Monday, September 26, 6:00 PM - 7:30 PM, Monterey Marriott, San Carlos Ballroom 4

  • Vikram Tolani
    “Comprehensive EUV Blank Defect Avoidance System”
    Tuesday, September 27, 9:40 AM - 10:00 AM, Monterey Conf. Ctr., Steinbeck 2/3

  • Mingwei Li
    “Reticle Qualification and Re-Qualification for EUV Production Today and in the Future”
    Wednesday, September 28, 12:00 PM - 12:20 PM, Monterey Conf. Ctr., Steinbeck 2/3

SPIE Photomask + Extreme Ultraviolet Lithography is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

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