OPC strategies to reduce failure rates with rigorous resist model stochastic simulations in EUVL

Alessandro Vaglio Pret, Trey Graves, David Blankenship, Stewart Robertson, Patrick Lee, John Biafore, KLA Corporation

Improved accuracy and robustness for advanced DRAM with tunable multi-wavelength imaging and scatterometry overlay metrology

John C. Robinson, KLA Corporation; Honggoo Lee, Sangjun Han, Minhyung Hong, Jieun Lee, Dongyoung Lee, Ahlin Choi, Chanha Park, SK Hynix, Inc. (Korea, Republic of); Dohwa Lee, Seongjae Lee, Jungtae Lee, Jeongpyo Lee, DongSub Choi, Sanghuck Jeon, Zephyr Liu, Hao Mei, KLA Corporation (Korea, Republic of); Eran Amit, Anna Golotsvan, Wayne Zhou, Eitan Herzel, Roie Volkovich, KLA Corporation (Israel)

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Vidya Ramanathan, Chen Dror, Victoria Naipak, Tal Yaziv, Renan Milo, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, KLA Corporation; Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Abhishek Gottipati, Yue Zhou, GLOBALFOUNDRIES Inc.

Defect learning with predictive sampling for process improvement

Ian Tolle, Julie Lee, Dave Salvador, GLOBALFOUNDRIES Inc. (United States); Barry Saville, Poh Boon Yong, Gino Marcuccilli, KLA Corporation

Presentation of the 2019 Karel Urbánek Best Student Paper Award

Process window discovery methodology for extreme ultraviolet (EUV) lithography

Sandip Halder, IMEC (Belgium); Kaushik Sah, Andrew Cross, KLA Corporation; Christophe Beral, IMEC (Belgium); Antonio Mani, KLA Corporation; Philippe Leray, Dieter Van den Heuvel, IMEC (Belgium); Vidyasagar Anantha, KLA Corporation

Novel method to achieve CD modeling in the presence of higher diffraction orders

Liequan Lee, Shankar Krishnan, KLA Corporation; Chi-Fu Yen, Shyh-Shii Pai, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan); Nick Weihan Chang, Hsien-Hung Chang, Li-Shiuan Tsai, Sheng-Yang Tseng, Jan-Hau Chang, Yung-Hsiang Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (China); Chu-Han Chiu, Phillip Atkins, KLA Corporation