Saratoga Springs City Center
Saratoga, New York, USA
May 6-9, 2019
1:30 p.m. – 3:35 p.m, Session 3, Defect Inspection 1
3.3
Inline Inspection Improvement using Machine Learning on Broadband Plasma Inspector in an Advanced Foundry Fab
SM Guo, JX Liu, TSMC; Rupesh Navalakhe, Andy Lee, Mahatma Lin, Martin Plihal, Jianyun Zhou, KLA Corporation
3.5
High-Throughput, Nondestructive Assessment of Defects in Patterned Epitaxial Films on Silicon by Machine Learning-Enabled Broadband Plasma Optical Measurements
Shravan Matham, Curtis Durfee, Brock Mendoza, Devendra K Sadana, Stephen W Bedell, John Gaudiello, Sean Teehan, IBM Research; HeungSoo Choi, Ankit Jain, Martin Plihal, KLA Corporation
5:15 p.m. – 7:00 p.m, Session 5, Poster Session
Fast and Accurate Defect Classification for CMP Process Monitoring
Yong-Yi Lin, Fu-Shou Tsai, Li-Chieh Hsu, Hsin-Kuo Hsu, Chih-Yueh, Li, Yu-Yuan Ke, Chih-Wei Huang, Jun-Ming Chen, UMC; Shao-Ju Chang, Tung-Ying Lee, Ethan Chen, Chao-Yu Cheng, Joe Chen, KLA Corporation
Inline Defect Control for Automotive Memory Devices in IC manufacturing
Chen-Men Lin and Yun-Chung Tung, Winbond Electronics; Shufen Lin, Steve Lin, Alex Cheng, KLA Corporation
Machine Learning Approaches for Nuisance Filtering in Inline Defect Inspection
SangHyun Lee, Ankit Jain, Martin Plihal, Saravanan Paramasivam, Tai-Kam Ng, Erfan Soltanmohammadi, KLA Corporation; Ian Tolle, Dave Salvador, GLOBALFOUNDRIES
Sensitivity Enhancement by Enabling Design-Based Inspection for DRAM
Y.M. Lu, J.W. Huang, Kevin Hsiao, Nanya Technology; Joe Chen, Alex Cheng, KLA Corporation